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View Generic Document: Chemical vapor deposition of titanium dioxide Citation: Hsu, Byron, Lei, Wang, Liau, Forrest, Lin, David and Wang, Teresa (2006). Chemical vapor deposition of titanium dioxide. . Collection: Transport Phenomena in Materials Engineering   Title Chemical vapor deposition of titanium dioxide Author(s) Hsu, Byron Lei, Wang Liau, Forrest Lin, David Wang, Teresa Keyword(s) diffusion Phase change Boundary layers Forced convection Heat/mass transfer coefficient Prandtl/Schmidt number Ceramic Electronic materials Abstract/Summary For chemical vapor deposition of titanium oxide, considering gas phase mass transfer and surface reaction kinetics, determine which is rate-limiting, and estimate the deposition rate. Date 2006-05-01 Copyright Notice Copyright: 2006 Byron Hsu, Wang Lei, Forrest Liau, David Lin, Teresa Wang; License: MIT Open CourseWare, http://ocw.mit.edu/OcwWeb/Global/terms-of-use.htm Copyright Agreement on Additional Notes Difficulty level: Junior; Solution time: 2 hours   Related Links Link Description http://teaching.matdl.org/teachingarchives/browser/trunk/matml/transport/problems/tio2-cvd.pdf?format=raw   problem   http://teaching.matdl.org/teachingarchives/browser/trunk/matml/transport/problems/tio2-cvd-solution.pdf?format=raw   solution       User Comments   Created: Mon, 16 Jul 2007, 11:02:37 EST by Cathy Lowe. Detailed History

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